TMAH AQUEOUS SOLUTIONS

Ultra-pure photoresist developer, surface preparation, cleaning, and etching

Ultra-pure photoresist developer, surface preparation, cleaning, and etching

MLI manufactures Tetramethylammonium Hydroxide [TMAH] CAS#75-92-2 in our US and China facilities with a patented chlorine-free manufacturing method.

We are the only manufacturer producing TMAH via an entirely sealed, fully integrated facility connected directly to a TMAC refinery. By reducing opportunities for contamination, we can guarantee metallic impurity levels of <1000 ppt.

TMAH is available at concentrations of choice (in water) up to 25%, and with or without surfactants with standard packaging options of 1000-liter IBC containers, 200-liter drums, and 1-gallon bottles.